Time-of-Flight Secondary Ion Mass Spectrometry (TOF-SIMS)
TOF-SIMS is a very sensitive surface analytical technique. It provides detailed elemental and molecular information about surfaces, thin layers, interfaces, and full three-dimensional analysis of the samples. Tof-SIMS technique is used in different areas including semiconductors, polymers, paint, coatings, glass ceramic, metals biomaterials, and pharmaceuticals. The TOF.SIMS 5 is the high-end TOF-SIMS instrument developed over the last 20 years. Its design guarantees optimum performance in all fields of SIMS applications.
X-ray Photoelectron Spectroscopy (XPS)
XPS provides information about the elemental and chemical composition of a surface. It can determine the surface concentration of elements present, chemical states, the molecular environment and/or oxidation state of metals. The high performance AXIS 165 X-ray photoelectron spectrometer can identify all elements (except H and He) present in the outer 10 nm of a sample down to 0.1 percent. Imaging XPS is a new technique that provides spatially-resolved chemical maps of a surface with a resolution down to 27 µm.